ZnO Films Deposited Using the Ultrasonic-Assisted Successive Ionic Layer Adsorption and Reaction Method for Dye Sensitized Solar Cell Applications

Akanksha Chougale1,2

Bikram Prasad3

Sarika Salunkhe4

Dnyaneshwar Shinde2

Vishal Kadam1

Chaitali Jagtap1,Email

1Advanced Physics Laboratory, Department of Physics, Savitribai Phule Pune University, Pune 411 007, India

2Department of Chemistry, Prof. Ramakrishna More Arts, Commerce & Science College, Akurdi. Pune-411044, India

3Department of Physics, Shri Mahanth Shatanand Giri college, Sherghati, Gaya-8224211, India

4Bharati Vidyapeeth University College of Engineering, Pune, India.

Abstract

Zinc Oxide (ZnO) photoanode has attracted great attention due to its favorable electronic and optical properties. The deposition of ZnO films using the ultrasonic-assisted successive ionic layer adsorption and reaction (SILAR) method has been done successfully on fluorine-doped tin oxide and glass substrates at various dipping cycles. The structural, morphological, and optical properties as well as the DSSC performance of the ZnO photoanodes were investigated. The ultrasonication process is used to enhance the compactness, crystallinity, shape, and size of the prepared ZnO films. The fabricated DSSC device with 150 SILAR cycles shows the highest efficiency of 0.78% with a JSC of 4.56 mA/cm2, VOC of 0.45 V, and FF of 0.38. The joint employment of the SILAR-dipping and ultrasonication process provided an effective way to prepare excellent photoanodes for DSSC application.                                                                                    

ZnO Films Deposited Using the Ultrasonic-Assisted Successive Ionic Layer Adsorption and Reaction Method for Dye Sensitized Solar Cell Applications