Study the Effect of ZnO/Cu/ZnO Multilayer Structure by RF Magnetron Sputtering For Flexible Display Applications

Himadri Sekhar Das,1,2,*Email

Gourisankar Roymahapatra

Prasanta Kumar Nandi1

Rajesh Das2

1 Indian Institute of Engineering Science and Technology (IIEST), Shibpur 711103, Howrah, West Bengal, India.

2 Haldia Institute of Technology, Haldia 721657, West Bengal, India.

Abstract

ZnO/Cu/ZnO multilayer structured glass and Polyethylene naphthalate (PEN) with different thicknesses of copper (Cu) layer were prepared by RF magnetron sputtering at Room Temperature. The electrical resistivity of the films were achieved 8.6x10-5W-cm and 4.5x10-4W-cm, the carrier concentration of 5.32x1021cm-3 and 1.36x1021cm-3, the low sheet resistance of  12W/cm2 and 16W/cm2 respectively on glass and PEN substrate respectively with the optical transmission of more than 80% for both cases at the optimum copper layer thickness. The conduction mechanism of the multilayer structure has been explained in terms of metal to oxide carrier injection with the variation of the thickness of the Cu layer. Different optimization procedures were used to achieve good optically transparent and electrically conductive films. The structural characterizations of multilayer films were carried out by X-ray diffraction (XRD); surface morphology and topography were performed by scanning electron microscopy and atomic force microscopy (AFM) respectively. The value of sheet resistance of the structure was influenced by the deposition condition of both layers. The effect of substrate and thickness of the Cu layer was investigated and illustrated.

Study the Effect of ZnO/Cu/ZnO Multilayer Structure by RF Magnetron Sputtering For Flexible Display Applications