Deposition of β-In2S3 Photosensitive Thin Films by Ultrasonic Spray Pyrolysis
Abstract
We report deposition of good quality β-In2S3 thin films with high photoresponse by using ultrasonic spray pyrolysis (USP) method. Thin films of β-In2S3 were deposited on glass substrates at 350 oC for three different molar concentrations (0.02, 0.04 and 0.06 M) of indium and sulfur precursors. The deposited thin films were stoichiometric, well adherent and compact. β-In2S3 thin films showed preferential orientation and high texture coefficients along the (103) lattice plane for all concentrations. The preferred orientation along (103) is the outcome of USP method which gives very fine and uniform deposition over large area. Using this novel approach the deposited films showed good photoresponse with On/Off of 88/57 ms for the 0.02 M concentration under white LED light source.
