Optical and Structural Properties of Nickel Doped Zinc Oxide Grown by Metal Organic Chemical Vapor Deposition (MOCVD) at Different Reaction Chamber Conditions

Zahra Manzoor 1,2

Vishal Saravade 1,2,3

Alexis Margaret Corda 2,4

Ian Ferguson 3,5

Luna Lu 1,2,4,  Email

 

1 Lyles School of Civil Engineering, Purdue University, West Lafayette, IN, USA 47907

2 Birck Nanotechnology Center, Purdue University, West Lafayette, IN, USA 47907

3 Department of Electrical and Computer Engineering, Missouri University of Science and Technology, Rolla, MO, USA 65401

4 School of Materials Engineering, Purdue University, West Lafayette, IN, USA 47907

5 Southern Polytechnic College of Engineering and Engineering Technology, Kennesaw State University, Marietta, GA, USA 30060

Abstract

Metal organic chemical vapor deposition (MOCVD) growth of nickel-doped zinc oxide (Ni-doped ZnO) thin films on sapphire is investigated, and structural and optical properties were studied. Samples were grown at two substrate temperatures (450 ℃ and 550 ℃) and at three chamber pressures (22, 30 and 100 Torr). The Ni-doped ZnO samples show (002) hexagonal crystal structure with signs of secondary phases in X-ray diffraction (XRD) measurements. However, different XRD peak intensity were observed for these samples at different growth conditions with same Ni flow rate injection to the reaction chamber. Also, samples grown at different growth conditions have different optical absorption spectra. Results prove that low pressure growth with temperatures close to the decomposition temperatures of the precursors, resulted in optimum dopant incorporation, sharp absorption band edges, and good crystalline quality.  

Optical and Structural Properties of Nickel Doped Zinc Oxide Grown by Metal Organic Chemical Vapor Deposition (MOCVD) at Different Reaction Chamber Conditions